TXRF 3800e applications

TXRF 3800e applications

The application of TXRF analysis is not limited to the analysis of metallic contamination on bare silicon wafers. TXRF analysis can be used to gauge the cleanliness of all fab processes, including cleaning, lithography, etching, ashing, films, etc. Beyond silicon devices, TXRF is also applicable to the fields of compound semiconductor devices, MEMS, organic electroluminescent materials, etc.

  • bare wafer
  • filmed wafer
  • patterned wafer
  • VPD-processed wafer
  • glass wafer
  • GaAs / SiC / sapphire