Semiconductors
 
 
TXRF 3750
XRR tools
XRF tools
TXRF tools
HR-XRD systems
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With decades of global market leadership in the semiconductor industry, our families of products enable everything from in-fab process control metrology to R&D for thin film and materials characterization.

Rigaku specializes in making TXRF, XRF, XRD and XRR metrology tools to measure critical process parameters from contamination to thin film thickness, composition, roughness, density, porosity, and crystal structure. 

With global 24/7 service and support, Rigaku delivers cutting edge solutions for yield enhancement and process development.

   
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TXRF 3750 total reflection XRF contamination metrology tool

The 3750 TXRF has the most advanced features available, including the patent pending X-Y-θ sample stage system; the patent pending computer controlled changeable 3 monochromator system; the in-vacuum wafer robotic transfer system, the patent pending compact rotating anode X-ray tube system and the new user-friendly windows software operating system. All of these contribute to higher throughput, higher accuracy and precision, and easy routine operation for the widest range of analyzable elements in the industry—Na through U.

All of these features are housed in a new compact and efficient design. The reliability has been substantially improved with the use of the new patent pending rotating anode system. The warranted lifetime of some of the anode components has doubled. Access for all maintenance work is through the front and rear panels. No access through the side panels is required. Thus, other cleanroom equipment may be placed next to the TXRF 3750. This represents a large savings in expensive cleanroom space.

Features

  • Rapid analysis results 
  • Ease of operation
  • Compact design
  • High power source
  • Three beam system