上照射式波长色散X射线荧光光谱仪

快速定量元素分析的高性能WDXRF

ZSX Primus III+

理学ZSX Primus III+提供主要和次要原子元素的快速定量测定,从氧(O)到铀(U)的最低标准的广泛样品类型。

高度可靠性的上照射式光学系统

ZSX Primus III+具有场新的上照射式光学配置。用户再也不用担心由于维护样品室导致的路径污染或停止时间。上照射式几何结构消除了清扫的担心并增加了时间。

高精度样品定位

高精度样品定位确保了样品表面与X设吸纳管之间的距离恒定。这对例如合金分析等需要高精度的应用非常重要。ZSX Primus III+使用一个独特的光学配置执行高精度分析,用于减少由于例如电熔铢和压片等样品中的非平面表面导致的错误。

SQX 基本参数软件与EZ扫描软件

用户使用EZ扫描软件可以在无需任何事先设置即可分析位置样品。这个节省时间的特征仅需点击鼠标和输入样品名称。结合SQX基本参数软件,快速提供最准确的XRF结果。SQX能够自动校正包括线重叠的所有矩阵效果。SQX还可以通过光电子(轻、超轻元素)、变化的环境、杂质和不同的样品尺寸校正辅助的激发效应。使用匹配库和完美的扫描分析程序提高准确性。

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Features

  • 从O到U的元素分析
  • 上照射式光学最小化污染
  • 小占地面积节省实验室空间
  • 高精度样品定位
  • 特殊光学减少由于弯曲的样品表面造成的错误
  • 统计过程控制(SPC)的软件工具
  • 优化抽空和真空泄露率改善吞吐量

ZSX Primus III+ specifications

General
  Elemental coverage ₈O through ₉₂U
  Optics Wavelength dispersive, sequential, tube above
X-ray generator
  X-ray tube End window, Rh-anode, 3kW, 60kV
  HV power supply High frequency inverter, ultra-high stability
  Cooling Internal water-to-water heat exchanger
Spectrometer
  Sample changer 48 positions standard
  Maximum sample size 51 mm (diameter) by 30 mm (high)
  Sample rotation speed 30 rpm
  Primary X-ray filters Al25, Al125, Ni40 and Ni400
  Beam collimators 4 auto-selectable diameters: 35, 30, 20 and 10 mm
  Divergence slit 3 auto-selectable: standard, high, and coarse (optional) resolutions
  Receiving slit For SC and for F-PC detectors
  Goniometer θ – 2θ independent drive mechanism
  Angular range SC: 5-118°, F-PC: 13-148°
  Angular reproducibility Ultra-high precision
  Continuous scan 0.1 - 240°/min
  Crystal changer 10 crystals, automatic mechanism
  Vacuum system High-speed system
Detector systems
  Heavy element detector Scintillation counter (SC)
  Light element detector Flow proportional counter (F-PC)
  Attenuator In-out automatic exchanger (1/10)

ZSX Primus III+ software

Overview:

  • Qualitative analysis:
    • Automatic peak identification
    • Smoothing, background subtraction
  • Quantitative analysis:
    • Matrix correction: Lachance-Traill, DeJohngh, JIS, etc.
    • Linear, quadratic and cubic regression, multiple line
    • Fundamental parameter method
  • EZ scan (qualitative)
  • Application template
  • Analysis area automatic selection (mask size detection)
  • Peak deconvolution (function and standard profile)
  • Background fitting (multi-point function fitting, area designation)
  • Fixed precision analysis
  • Help function
  • E-mail forwarding function
  • Universal standard sample
  • Analysis simulation program (analysis depth evaluation, etc.)

Optional:

  • SQX program
    • EZ scan (SQX)
    • Fixed angle measurement
    • Thin-film analysis
    • Theoretical overlap correction
    • Drift correction library
    • Photoelectron FP method
    • Sample film correction
      • Impurity correction
      • Matching library
      • SQX scatter FP method
      • Material judgment
  • Quantitative scatter FP method
  • Quantitative FP theoretical overlap correction
  • Fusion disk correction (flux evaporation)
  • Charge correction
  • Program operation
    • Time preset analysis
    • Energy saving
    • Auto power off
  • Remote control function (VCP)