Skip to main content

Crystal defect analysis by X-ray reflection topography

AppNote B-XRD2022: crystal defect analysis by X-ray reflection topography

Background

Crystal defects in epitaxial thin films may cause problems when producing high-performance semiconductor devices. Epitaxial thin films may inherit crystal defects from the single crystal substrate. It is important to evaluate the grains and crystal defects of the single crystal substrate before film growth on it. X-ray topography is an XRD imaging technique used to observe crystal defect distribution in a single crystal substrate. The SmartLab automated multipurpose X-ray diffractometer, equipped with an Xsight™ Micron FC high-sensitivity X-ray CCD camera, is capable of obtaining high-resolution topographs like those measured with dedicated equipment.

XRD products from Rigaku

New 6th-generation general purpose benchtop XRD system for phase i.d and phase quantification

Advanced state-of-the-art high-resolution XRD system powered by Guidance expert system software

Highly versatile multipurpose X-ray diffractometer with built-in intelligent guidance

High-performance, multi-purpose XRD system for applications ranging from R&D to quality control

Laboratory micro-spot XRD residual stress analysis with both iso- and side-inclination methods

2D X-ray detector with latest semiconductor technology designed for home lab diffractometers