Crystal defects in epitaxial thin films may cause problems when producing high-performance semiconductor devices. Epitaxial thin films may inherit crystal defects from the single crystal substrate. It is important to evaluate the grains and crystal defects of the single crystal substrate before film growth on it. X-ray topography is an XRD imaging technique used to observe crystal defect distribution in a single crystal substrate. The SmartLab automated multipurpose X-ray diffractometer, equipped with an XTOP high-sensitivity and high-resolution X-ray camera, is capable of obtaining high-resolution topographs like those measured with dedicated equipment.
Advanced state-of-the-art high-resolution XRD system powered by Guidance expert system software
Highly versatile multipurpose X-ray diffractometer with built-in intelligent guidance
New 6th-generation general purpose benchtop XRD system for phase i.d and phase quantification
Compact X-ray diffractometer for quality control of materials that is easy to use and is ideal for routine work
Laboratory micro-spot XRD residual stress analysis with both iso- and side-inclination methods
Windows®-based software suite for Rigaku's X-ray diffractometers