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Evaluation of uniformity of thin film thickness by X-ray reflectivity mapping

AppNote XRD2030: Evaluation of uniformity of thin film thickness by X-ray reflectivity mapping

 

The characteristics of various devices composed of nanometer-scale thin films is affected by film structure parameters such as film thickness and density. X-ray reflectivity (XRR) is a method for analyzing film thickness, density and surface or interface roughness of single- or multi-layer thin films nondestructively. It can be applied to not only crystalline materials but also to amorphous substances and materials opaque under visible light.

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