An incident X-ray beam impinges upon the sample at a shallow angle resulting in virtually complete reflection of the excitation beam away from the silicon drift detector. This affords dramatically reduced background contributions in the measured energy dispersive X-ray fluorescence spectra. Ultra-trace elemental analysis of the liquid sample becomes possible using the NANOHUNTER II and “Drop and Dry” sample preparation technique.
TXRF products from Rigaku
The new, next generation benchtop total reflection X-ray fluorescence (TXRF) spectrometer
Trace elemental surface contamination metrology by TXRF; up to 200 mm wafers.
Trace elemental surface contamination metrology by TXRF; up to 300 mm wafers
Ultra-trace elemental surface contamination metrology by TXRF with VPD capability; up to 300 mm wafers