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Qualitative analysis of residual abrasive on glass surface

AppNote B-XRF3008: pharmaceutical intermediates by TXRF

Background

Various materials are used in the process of polishing glass to remove fine scratches on glass surface or improve smoothness. Hematite particles (α-Fe₂O₃) were used formerly and recently using Bastnasite particles (CeO₂ basis) has become mainstream. The new materials are also being studied instead of expensive R.E. Bastnasite abrasive is known to be effective for polishing by chemical reaction between its main component CeO₂ and glass. At the same time, however, it tends to remain on the sample surface after polishing. On a measurement result of a commercially available glass substrate, Ce and Ba, which are abrasive components, were detected on the surface, suggesting that the abrasives are remained. It can be removed by re-polishing with alumina abrasive.

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