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Max-Flux TXRF
  • Easy Alignment
  • Increased intensity on sample
  • Greatly decreased background, especially from spurious lines from the x-ray source
  • Excellent control of X-ray beam profile and divergence
  • Improved data collection
  • Available for Cu, Mo, Co, Ag, Au, Cr, W Kα, W Kβ and other X-ray energies

Focusing graded multilayer monochromator

Maximizes intensity on the sample within the total external reflection angle for TXRF

Max-flux TXRF Optic

Introduced by Rigaku Innovative Technologies in the early 1990’s, graded multilayer monochromators provide increased intensity and decreased background for Total Reflection X-ray Fluorescence Spectrometry. Max-Flux® Optics use graded multilayers, assuring the same X-ray energy diffracts from every point along the surface of the Elliptical optic. Rigaku’s Osmic® Coating technology provides results in less than 0.5% d-spacing variation. Such high precision means more flux is available for your experiment. Optical precision is also critical to good performance. Using proprietary technology, standard Max-Flux optics are made within ~10 arcsec of the ideal curve. When the best performance is required, Rigaku applies new Arc)Sec® technology to achieve optical precision of ≤4 arcsec


Product name Max-Flux TXRF optic
Technique For Total Reflection X-ray Fluorescence spectrometry
Benefit Increased intensity on the sample
Technology Multilayer elliptical optics
Core attributes Excellent Kα/Kβ ratio
Core options Custom designed
Computer N/A
Core dimensions Varies with configuration
Mass (core unit) Varies with configuration
Power requirements N/A