- Ease of operation and rapid analysis results
- Accepts 200 mm and smaller wafers
- Low cost of ownership
- Compact design, footprint
- Sealed X-ray tube source
- Wide range of analytical elements (S~U)
- Application to bare Si and to non-Si substrates
- Zero edge exclusion (ZEE-TXRF) measurement capability
- Import measurement coordinates from defect inspection tools for follow-up analysis
Surface contamination metrology
Measure elemental contamination at discrete points or with full wafer maps
TXRF analysis can gauge contamination in all fab processes, including cleaning, litho, etch, ashing, films, etc. The TXRF 3800e can measure elements from S through U with a single-target, dual-beam X-ray system and a new liquid nitrogen-free detector system.
The TXRF 3800e includes the Rigaku patent pending X-Y-θ sample stage system, an in-vacuum wafer robotic transfer system, and new user-friendly windows software. All of these contribute to higher throughput, higher accuracy and precision, and easy routine operation.
Optional Sweeping TXRF software enables mapping of the contaminant distribution over the wafer surface to identify "hot spots" — out to zero edge exclusion.
All of these features are housed in a new, compact, and efficient design. Access for all maintenance work is through the front and rear panels, so other cleanroom equipment may be placed next to the TXRF 3800e. This represents a large savings in expensive cleanroom space.
|Total reflection X-ray fluorescence (TXRF)
|Rapid elemental analysis, of S to U, to gauge wafer contamination in all fab processes
|Dual-beam TXRF system with liquid nitrogen-free detector
|Up to 200 mm wafers, XYθ sample stage system, in-vacuum wafer robotic transfer system
|SECS/GEM communication software. Sweeping TXRF software enables mapping of the contaminant distribution over the wafer surface to identify "hot spots"
|Internal PC, MS Windows® OS
|1000 (W) x 1760 (H) x 948 (D) mm
|100 kg (core unit)
|3Ø, 200 VAC 50/60 Hz, 100 A