Winter 2013, Volume 29, No. 1

  • Crystal defects in SiC wafers and a new X-ray topography system by Kazuhiko Omote
  • Evaluation of power semiconductor device wafers by total reflection X-ray fluorescence spectrometers by Hiroshi Kohno
  • Introduction to single crystal X-ray analysis III: Obtaining quality data from a microcrystal by Akihito Yamano and Mikio Yamasaki
  • Improvements for high-pressure cell measurements using the latest single crystal laboratory systems by Hiroyasu Sato
  • X-ray fluorescence attachment for rapid in-house evaluation of heavy atom derivative crystals in protein crystallography and in-house MAD using the dual wavelength system by Takashi Matsumoto, Kimiko Hasegawa and Tomokazu Hasegawa
  • Analysis of environmental samples using an energy-dispersive X-ray fluorescence spectrometer NEX CG by Takao Moriyama
  • Curved imaging plate X-ray diffraction system DualSource RAPID II
  • Sequential benchtop WDXRF spectrometer Supermini200
  • Integrated platform SmartStudio
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