Rigaku Publishes New Product Release on EUVL Optical Coatings

The current edition of Photonics Spectra magazine features a Product Release from Rigaku Innovative Technologies Inc. on EUVL Optical Coatings

May 22, 2017 – Auburn Hills, Michigan. Rigaku Innovative Technologies (RIT) has published a new product release describing precision extreme UV lithography (EUVL) optical coatings. The article appears in the May 2017 edition of Photonics Spectra, and was selected by the publication.

The coatings from Rigaku Innovative Technologies Inc. are designed for manufacturing reflective mirrors in semiconductor industry wafer pattern printing. They are used in next-generation lithography techniques that will enable the semiconductor industry to continue to reduce printed transistor size. This increases device functionality by greatly increasing the number of transistors that can be printed on a chip. The chips also consume less power, which is a critical factor in extending device battery life.

The new chips will be used to continue the evolution of smartphone technology, GPS devices, home entertainment and numerous other wireless applications.
RIT is a supplier of the full range of Extreme Ultraviolet (EUV) multilayers and coatings for optics with over 20 years’ experience, and participates in the global research and infrastructure-development of the commercial EUVL (EUV Lithography) implementation to support the continued scaling of computer chip circuitry.

The article, in the May edition of Photonics Spectra, is available in print or online at

For further information, contact:

Nick Grupido
Vice President, Sales & Marketing
Tel: +1-248-232-6400