X-ray and EUV optics products

EUV optics   EUV optics
Multilayer optics for extreme ultraviolet lithography patterning of semiconductor wafers
  Confocal Max-Flux   Confocal Max-Flux®
Custom focusing CMF X-ray optics for X-ray diffraction
  SAXS optic   Confocal Max-Flux® SAXS optic
Special CMF optic designed for SAXS instrumentation
Max-Flux   Max-Flux® XRD
Parallel beam graded multilayer monochromator for XRD
  Max-Flux TXRF   Max-Flux® TXRF
Focusing graded multilayer monochromator for TXRF
  Ovonyx   Ovonyx™
Light element analyzer for laboratory XRF instruments
VariMax   VariMax™
Single wavelength Confocal Max-Flux (CMF) optics for protein crystallography
  VariMax DW   VariMax™ DW
Dual wavelength Confocal Max-Flux (CMF) optics for protein crystallography
  Custom optics   EUV replicated optics
Custom designed optics for EUV and X-ray sources
Custom Optics   Custom Optics
Custom Confocal Max-Flux focusing optics for beamline applications
  Custom Optics   Multi-foil Optics for EUV and X-ray radiation
Soft X-ray and EUV optics

One mission of Rigaku's Innovative Technology division is to be the world's best in producing X-ray and neutron multilayer coatings, optics, and instruments. Development of innovative solutions that address the needs of X-ray instrument designers and users, production of high quality performance products and on-time-delivery, are a few examples of how Rigaku is able to achieve this goal.

Rigaku's products enable improvements in instrumentation and materials used by many industries to better their products. Today thousands of Rigaku's multilayer optics are in use in X-ray spectrometers and diffractometers made by analytical instrument companies. Rigaku's synchrotron optics are in use world-wide.

A multilayer optic is produced by depositing alternating layers of light-element- and heavy-element-containing materials onto a substrate. The layer thickness acts like the d spacing in a crystal in the sense that X-rays impinging on a multilayer optic at the proper θ angle will produce a monochromatic diffracted X-ray beam. If the layer thickness is varied across a pre-curved substrate, a graded optic can be produced that captures a larger angle of X-rays from the source and produces either a focused or parallel X-ray beam.