X-ray and EUV optics products

  EUV optics
Multilayer optics for extreme ultraviolet lithography patterning of semiconductor wafers
    Confocal Max-Flux®
Custom focusing CMF X-ray optics for X-ray diffraction
    Confocal Max-Flux® SAXS optic
Special CMF optic designed for SAXS instrumentation
  Max-Flux® XRD
Parallel beam graded multilayer monochromator for XRD
    Max-Flux® TXRF
Focusing graded multilayer monochromator for TXRF
Light element analyzer for laboratory XRF instruments
Single wavelength Confocal Max-Flux (CMF) optics for protein crystallography
    VariMax™ DW
Dual wavelength Confocal Max-Flux (CMF) optics for protein crystallography
    EUV replicated optics
Custom designed optics for EUV and X-ray sources
  Custom Optics
Custom Confocal Max-Flux focusing optics for beamline applications
    Multi-foil Optics for EUV and X-ray radiation
Soft X-ray and EUV optics

One mission of Rigaku's Innovative Technology division is to be the world's best in producing X-ray and neutron multilayer coatings, optics, and instruments. Development of innovative solutions that address the needs of X-ray instrument designers and users, production of high quality performance products and on-time-delivery, are a few examples of how Rigaku is able to achieve this goal.

Rigaku's products enable improvements in instrumentation and materials used by many industries to better their products. Today thousands of Rigaku's multilayer optics are in use in X-ray spectrometers and diffractometers made by analytical instrument companies. Rigaku's synchrotron optics are in use world-wide.

A multilayer optic is produced by depositing alternating layers of light-element- and heavy-element-containing materials onto a substrate. The layer thickness acts like the d spacing in a crystal in the sense that X-rays impinging on a multilayer optic at the proper θ angle will produce a monochromatic diffracted X-ray beam. If the layer thickness is varied across a pre-curved substrate, a graded optic can be produced that captures a larger angle of X-rays from the source and produces either a focused or parallel X-ray beam.