GISAXS analysis of porous silica thin films with organized pore networks

Porous silica films are playing an important role in modern electronic and magnetic devices due to their excellent heat-insulating properties and relatively low dielectric constants. Their special network structure can also be used for sound detection.

In addition, because the size of the pores in the porous silica films are typically on the nanometer scale, they make perfect templates for the growth of nano-materials.

A 2D scattering pattern from a 20 nm thick porous silica film on silicon substrate using grazing-incidence small-angle X-ray scattering (GISAXS) method is shown in Figure 1.

2D scattering pattern
Figure 1

The measurement was carried out on a Rigaku S-MAX3000 SAXS system with a 200 mm 2D detector. Peaks up to the second order along the qx direction are observed. The spacing between the peaks is 0.052 Å-1, suggesting a periodic pore-pore spacing of 12 nm, as shown in Figure 2.

Peaks up to the second order along the qx direction are observed
Figure 2

S-MAX3000The S-MAX3000 pinhole SAXS camera design is available with a choice of conventional or high brilliance X-ray sources. A 3-meter, fully evacuated camera length provides both high intensity and high resolution. Coupled with a fully integrated 2-dimensional multi-wire proportional counter, the system is capable of making highly sensitive measurements from both isotropic and anisotropic materials. A wide range of sample stage attachments provide maximum flexibility in controlling environmental sample conditions during measurement. Read more about S-MAX3000...