SmartLab training (The Woodlands)

What are our students saying about our XRD training sessions?

"Everyone is very helpful and goes out of their way to help"

"The training courses made everything very clear"

"Got me excited about incorporating XRD into my research"

"Instructors are very flexible in adjusting presentations to our interests"

"I'm excited to get home and try new things"

"They are very interested in making the instrument meet my needs"

1-, 2-, 3-, 4-, 5-day, options available. See registration form and class outline for specifics.

Course description

DAY ONE (9:00 a.m. to 5:00 p.m.)

  • Introduction
  • X-ray safety
  • X-ray diffraction and instrumentation
  • Basic operation of SmartLab diffractometer
  • Routine maintenance
  • X-ray reflectometry
    • X-ray reflectometry method
    • X-ray reflectometry measurement techniques
    • X-ray reflectometry film structure analysis
  • Powder diffraction
    • Powder diffraction method
    • Powder diffraction measurement techniques
    • How to select right geometry and measurement conditions
    • Understanding sources of errors

DAY TWO (9:00 a.m. to 5:00 p.m.)

  • Grazing incidence XRD
    • Traditional grazing incidence XRD thin film measurements
  • In-plane XRD
    • In-plane grazing incidence XRD thin film measurements
  • Pole figure
    • Pole figure method
  • Residual stress
    • Residual stress method

DAY THREE AM (9:00 a.m. to 12:00 p.m.)

  • Pole figure
    • Pole figure measurement techniques
    • Pole figure preferred orientation analysis
  • Residual stress
    • Residual stress measurement techniques
    • Residual stress analysis

DAY THREE PM (1:00 p.m. to 5:00 p.m.)

NOTE: Please choose DAY THREE PM CHOICE A or CHOICE B

CHOICE A

  • Small angle X-ray scattering
    • Small angle X-ray scattering method
    • Small angle X-ray scattering measurement techniques
    • Small angle X-ray scattering particle size analysis

CHOICE B

  • High resolution XRD for single crystals and epitaxial films
    • High resolution XRD method
    • High resolution XRD measurement techniques
    • High resolution XRD epitaxial layer structure analysis

DAY FOUR (9:00 a.m. to 5:00 p.m.)

  • Opening raw data files
  • Overlaying multiple patterns and manipulating multiple files for trend information
  • Adding or subtracting overlays,
  • Merging segments, etc
  • Accessing data; storing and printing processed data
  • Processing: Background/Kα2 subtraction; Smoothing
  • Search/Match: Identifying phases, tools and techniques to aid your search
  • Building your own database of commonly used materials
  • Profile Fitting techniques/ crystallite size/ % crystallinity (if appropriate)
  • Preview of Quantitation modules Either/ or:
    1. Easy Quant using RIR relative intensity ratio method
      Easy quant using calibration curves
    2. Whole Pattern Fitting/ Rietveld analysis—quantitation

DAY FIVE (9:00 a.m. to 5:00 p.m.)

  1. Overview of Rietveld Basic Operations
    • Loading phases (atomic structure phases or structure-less phases ):
    • Global parameters for refinement
    • Phase parameters for refinement
    • Refinement controls: global and phase
    • Displays and results, including report output formats for various publications
  2. Practical Examples:
    • Example patterns with specific features are presented to emphasize basic concepts
  3. Specific Topics also covered
    • Background Model Parameters-polynomial versus user defined backgrounds
    • Interpretations of statistical and graphical displays of refinements
    • Refinement operation using structure-less phases
    • Automatic atomic coordinates linking (cif, csf)
    • Internal standard calibrations for 2θ reference
    • Easy instrument properties modification- sample displacement shift theta compensating slits, thin film absorption, cylindrical specimen, etc.
    • Solid solution substitutions and site occupancy refinements
    • Rotating 3-D structure viewing and stereo projections
    • Interactive links to Search/Match for residual unmatched area
  4. Constraints on Variables
    • Multiple data regions can be excluded (i.e. Sample holder or substrate reflections)
    • Preferred orientations corrections
    • Individual FWHM profile shape fitting for turbostatic effects.
    • Lattice/crystal structure parameters
    • Selective use of phases in refinement (phases included or excluded from refinements)
Customer site software and instrument training course:
  • Convenience of your own site for training
  • Custom designed to accommodate your instrument
  • Custom designed to cater to your staff
  • From two to five days of individual attention from expert trainers

Please contact Michelle Goodwin at (281) 362-2300 ext. 122 to schedule training today!