AZX 400
Features
- Large sample analysis
- Up to 400 mm (diameter)
- Up to 50 mm (thickness)
- Up to 30 kg (mass)
- Sample adapter system
- Adaptable to various sample sizes
- Measurement spot
- 30 mm to 0.5 mm diameter
- 5-step automatic selection
- Mapping capability
- Allows multipoint measurements
- Sample view camera (option)
- General purpose
- Analyze Be - U
- Elemental range: ppm to %
- Thickness range: sub Å to mm
- Diffraction interference rejection (option)
- Accurate results for single-crystal substrates
- Compliance with industry standards
- SEMI, CE marking
- Small footprint
- 50% footprint of the previous model
Sequential wavelength dispersive XRF spectrometer for large samples
Film thickness and composition measurements on large and heavy samples, wafers, and media disks
Specifications
Product name | AZX 400 |
Technique | Sequential wavelength dispersive X-ray fluorescence |
Benefit | Flexibility to measure a variety of sample types, including 50 - 300 mm wafers, coupons, and sputtering targets (up to 30 kg) |
Technology | Analytical flexibility to measure elements from Be to U, well-suited for process R&D and low-volume, high product mix environments |
Core attributes | 4 kW sealed X-ray tube, Sequential type goniometer, Primary beam filter; Measurement spot sizes 30, 20, 10, 1, and 0.5 mm (diameter) |
Core options | Wafer Loader, SQX (Scan Quant. X) software, CCD Camera |
Computer | External PC, MS Windows® OS, Software: film thickness/concentration simultaneous analysis software, Fundamental Parameter software for thin film analyses |
Core dimensions | 1376 (W) x 1710 (H) x 890 (D) mm |
Mass | Approx. 800 kg (core unit) |
Power requirements | 3Ø, 200 VAC 50/60 Hz, 50 A |