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TXRF Spectrometers

Total reflection X-ray fluorescence spectroscopy (TXRF) is a powerful analytical technique used for the elemental analysis of samples with very low concentrations of trace elements. In TXRF, a primary X-ray beam is directed onto a sample at a very shallow angle, causing total reflection at the sample surface. This results in an X-ray standing wave within a thin layer of the sample, maximizing the interaction between the X-rays and the sample material. The fluorescence emitted by the sample in response to this excitation is then detected and analyzed to determine the elemental composition and concentration. TXRF is particularly advantageous for analyzing liquid samples or very small sample amounts, as it offers high sensitivity, excellent reproducibility, and low detection limits, making it an invaluable tool in fields such as environmental monitoring, nanotechnology, and semiconductor analysis.

Products

TXRF 3760

TXRF spectrometer for wafer surface contamination for up to 200 mm wafers

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TXRF 310Fab

TXRF spectrometer for wafer surface contamination for up to 300 mm wafers

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TXRF 310Fab-R

Advanced tool for ultratrace elemental contamination analysis

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TXRF-V310

TXRF-VPD spectrometer for wafer surface contamination for up to 300 mm wafers

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Application notes

Explore the example analyses to see which analytical technique is right for you.

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