In-line, simultaneous WDXRF spectrometer for wafer metal film metrology; up to 300 mm wafers
Simultaneous WDXRF spectrometer for wafer metal film metrology; up to 200 mm wafers
Sequential WDXRF spectrometer for elemental analysis and thin-film metrology of large and/or heavy samples
XRF and optical metrology tool for blanket and patterned wafers; up to 300 mm wafers
A modernized 2D Kratky system that eliminates data corrections required of traditional systems
This versatile X-ray metrology tool enables high-throughput measurements on blanket wafers ranging from ultra-thin single-layer films to multilayer stacks for process development and film quality control.
A fast, high-resolution laboratory X-ray topography system for non-destructive dislocation imaging
Benchtop tube below sequential WDXRF spectrometer analyzes O through U in solids, liquids and powders