Measure almost any element in almost any matrix
X-ray fluorescence (XRF) provides one of the simplest, most accurate and most economic analytical methods for the determination of elemental composition of many types of materials. Indispensable to both R&D and quality assurance (QA) functions, our advanced and unique WDXRF products are routinely used to analyze products from cement to plastics and from metals to food to semiconductor wafers. Rigaku offerings range from high power, high-performance wavelength dispersive WDXRF systems, for the most demanding applications, to a complete line of benchtop EDXRF and WDXRF systems.
Theory of X-ray fluorescence
In X-ray fluorescence (XRF), an electron can be ejected from its atomic orbital by the absorption of a light wave (photon) of sufficient energy. The energy of the photon (hν) must be greater than the energy with which the electron is bound to the nucleus of the atom. When an inner orbital electron is ejected from an atom (middle image), an electron from a higher energy level orbital will be transferred to the lower energy level orbital. During this transition a photon maybe emitted from the atom (bottom image). This fluorescent light is called the characteristic X-ray of the element. The energy of the emitted photon will be equal to the difference in energies between the two orbitals occupied by the electron making the transition. Because the energy difference between two specific orbital shells, in a given element, is always the same (i.e. characteristic of a particular element), the photon emitted when an electron moves between these two levels, will always have the same energy. Therefore, by determining the energy (wavelength) of the X-ray light (photon) emitted by a particular element, it is possible to determine the identity of that element.
Benchtop tube below sequential WDXRF spectrometer analyzes O through U in solids, liquids and powders
High-power, tube-below, sequential WDXRF spectrometer with new ZSX Guidance expert system software
High power, tube above, sequential WDXRF spectrometer with new ZSX Guidance expert system software
High power, tube below, sequential WDXRF spectrometer with Smart Sample Loading System (SSLS)
High power, tube above, sequential WDXRF spectrometer
WDXRF spectrometer designed to handle very large and/or heavy samples
High-throughput tube-above multi-channel simultaneous WDXRF spectrometer analyzes Be through U
WDXRF ultra low sulfur analyzer for method ASTM D2622
WDXRF ultralow chlorine analyzer
ASTM D2622 method WDXRF analyzer for sulfur (S) in petroleum fuels and ULSD
Tube below, single element WDXRF analyzer for quality control applications
High-performance, Cartesian-geometry EDXRF elemental analyzer measures Na to U in solids, liquids, powders and thin films
Variable collimator small spot 60 kV EDXRF system featuring QuantEZ software.
60 kV EDXRF system featuring QuantEZ software and optional standardless analysis
Low-cost EDXRF elemental analyzer measures Na to U in solids, liquids, powders and thin-films
Performance EDXRF elemental analyzer measures Na to U in solids, liquids, powders and thin-films
EDXRF spectrometer with powerful Windows® software and optional FP.
Scanning multi-element process coatings analyzers for web or coil applications
EDXRF multi-element process analyzer; analyze aluminum (Al) through uranium (U)
In-line, simultaneous WDXRF spectrometer for wafer metal film metrology; up to 300 mm wafers
Simultaneous WDXRF spectrometer for wafer metal film metrology; up to 200 mm wafers
Sequential WDXRF spectrometer for elemental analysis and thin-film metrology of large and/or heavy samples
XRF and optical metrology tool for blanket and patterned wafers; up to 300 mm wafers
This versatile X-ray metrology tool enables high-throughput measurements on blanket wafers ranging from ultra-thin single-layer films to multilayer stacks for process development and film quality control.