What Is High-temperature X-ray Diffraction Used For?
Study material behavior as a function of temperature
X-ray diffraction (XRD) at non-ambient conditions can be used for a variety of applications, including the study of dynamic processes that need to be investigated in situ. Examples of such processes are the reactions involving the solid state, phase transitions, crystallite growth, thermal expansion, etc. X-ray diffraction can be used as a very informative complement to other, more traditional, thermal analytical techniques (thermogravimetry, differential scanning calorimetry, etc.), thus effectively providing phase identification, texture analysis, and crystallite size measurement.
Rigaku recommends the following products
MiniFlex
Sixth-generation general purpose benchtop XRD system for phase ID and phase quantification
Learn moreSmartLab
Advanced, state-of-the-art, high-resolution XRD system powered by Guidance expert system software
Learn moreSmartLab SE
Highly versatile multipurpose X-ray diffractometer with built-in intelligent guidance
Learn moreApplication notes
The following application notes are relevant to this technique
-
BATT1018 - XRD Measurement with Temperature Control and Charge/Discharge Using Laminated Cells
-
B-XRD2039 - Observation of Anisotropic and Nonlinear Thermal Expansion of Thin Films on Substrates by In-Plane X-ray Diffraction
-
B-XRD1169 - Temperature-dependent Analysis of Polymer Crystallization Behavior Using High-speed Time-resolved Measurement
-
B-XRD1133 - Observation of Phase Transition Behavior of Pharmaceutical Materials with a Benchtop XRD System
-
B-XRD1117 - Observation of a Phase Transition at High Temperature under Various Atmospheres
-
B-XRD1105 - High-speed in-situ Measurement of Melting Process of Metal
-
B-XRD1101 - High-T analysis - MiniFlex with HyPix-400 MF / BTS 500
-
B-XRD1011 - Temperature Dependence of a Lattice Constant
Contact Us
Whether you're interested in getting a quote, want a demo, need technical support, or simply have a question, we're here to help.