跳转到主要内容

通过PDF 分析计算酞菁铜的分子层积间隔

AppNote XRD1139: 通过PDF 分析计算酞菁铜的分子层积间隔

导言

酞菁化合物作为有机低分子材料被人们所知,其优异的电气特性和耐用性,被广泛用作有机半导体材料和新干线的青色涂料。而通过在酞菁分子的中心配位金属元素表现出多种光学和电气特性。酞菁形成了分子堆叠的柱状分子层积结构,并在分子层积方向表现出单轴导电性。电气特性取决于分子层积间隔,但常规的粉末X射线衍射无法估算分子层积间隔。由于PDF分析可以计算重元素的原子间距,因此可以有效计算金属酞菁的中心金属原子间距。

XRD products from Rigaku

Advanced state-of-the-art high-resolution XRD system powered by Guidance expert system software

Highly versatile multipurpose X-ray diffractometer with built-in intelligent guidance

New 6th-generation general purpose benchtop XRD system for phase i.d and phase quantification

Laboratory micro-spot XRD residual stress analysis with both iso- and side-inclination methods

2D X-ray detector with latest semiconductor technology designed for home lab diffractometers