GISAXS分析多孔硅薄膜和有组织的孔道网络

多孔硅薄膜在现代电子和磁性设备领域中发挥重要作用,由于它们的优异的保温隔热性能和相对较低的介电常数,它们特别的网路结果也用于声检测。

此外,由于多孔硅薄膜的孔大小通常为纳米尺度,因此它们是纳米材料生长的完美模板。

如图1所示,是通过掠入射小角X射线散射(GISAXS)法测定的一个在硅基板上的20nm厚的多孔硅薄膜二维散射图谱。

2D scattering pattern
Figure 1

该实验使用理学S-MAX3000 SAXS仪器和一个200毫米的二维探测器进行测定。峰沿着qx方向在第二阶被观察到。如图2所示山峰之间的距离为0.052 Å-1,表明周期的孔与孔的间距为12微米。

Peaks up to the second order along the qx direction are observed
图2



The S-MAX3000 pinhole SAXS camera design is available with a choice of conventional or high brilliance X-ray sources. A 3-meter, fully evacuated camera length provides both high intensity and high resolution. Coupled with a fully integrated 2-dimensional multi-wire proportional counter, the system is capable of making highly sensitive measurements from both isotropic and anisotropic materials. A wide range of sample stage attachments provide maximum flexibility in controlling environmental sample conditions during measurement. Read more...