跳转到主要内容

X-ray optics from Rigaku

Custom focusing CMF X-ray optics for X-ray diffraction

Special CMF optic designed for SAXS instrumentation

Custom Confocal Max-Flux focusing optics for beamline applications

Multilayer optics for extreme UV lithography patterning of semiconductor wafers

Focusing graded multilayer monochromator for TXRF

Parallel beam graded multilayer monochromator for XRD

Light element analyzer for laboratory XRF instruments

Custom designed optics for EUV and X-ray sources

Custom designed optics for EUV and X-ray sources

Single wavelength Confocal Max-Flux (CMF) optics for single crystal diffraction

Single wavelength Confocal Max-Flux (CMF) optics for single crystal diffraction

Dual wavelength Confocal Max-Flux (CMF) optics for single crystal X-ray diffraction