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Film thickness/composition and wafer contamination tools

Rigaku is a pioneer and world leader in designing and manufacturing X-ray technology based instrumentation to solve manufacturing challenges in semiconductor R&D and production. With more than 35 years of global market leadership in this industry, our families of products enable everything from in-fab process control metrology to R&D for thin film and materials characterization. Our X-ray Diffraction (XRD), X-ray Fluorescence (XRF), X-ray Reflectometry (XRR) and X-ray topography (XRT) metrology tools measure critical process parameters like thin film: thickness, composition, roughness, density, porosity, and crystal structure and crystal structure defects. In addition, we offer process Total Reflection X-ray Fluorescence (TXRF) and Vapor Phase Decomposition-Total Reflection X-ray Fluorescence (VPD-TXRF) tools for contamination measurement. With global 24/7 service and support, Rigaku delivers cutting-edge solutions for your yield enhancement and process development.

Rigaku recommends the following systems:


Advanced state-of-the-art high-resolution XRD system powered by Guidance expert system software