Liquid analysis by total reflection X-ray fluorescence spectrometer
Total Reflection X-ray Fluorescence (TXRF) is a method that can be used for high sensitive elemental analysis on solid sample surface, and has been widely...
Total Reflection X-ray Fluorescence (TXRF) is a method that can be used for high sensitive elemental analysis on solid sample surface, and has been widely...
In modern society where our daily environment is supported by various electronic devices, it is critical to pursue opto-electronic or power-electronic devices with less environment...
Although high-resolution X-ray diffraction (HR-XRD) has been commonly employed for the crystallinity characterization of GaN-related materials, special care is required due to the complexities resulting...
Total reflection of X-rays occurs on the surface of a measured object by X-ray irradiation at an extremely low glancing angle (less than 0.1°). X-rays...
X-ray fluorescence spectrometry (XRF) is well known as an analysis method with high precision by means of non-destructive and no contact analysis, and is therefore...
High-voltage and high-efficiency power devices are in strong demand as a way of decreasing energy consumption in a wide range of industrial and consumer products...
TXRF spectrometers are widely used as evaluation instruments for measuring contamination in the semiconductor fabrication process. This is mainly because the TXRF technique allows non-destructive...
Due to the recent development of fundamental technologies of X-ray generators and detectors, such as X-ray focusing optics and area detectors, the size of the...
Total reflection X-ray fluorescence (TXRF) spectrometry is widely used in semiconductor manufacturing processes for nondestructive analyses of metallic contamination on wafer surfaces. Sensitivity requirements for...
The newly-released sequential general-purpose wavelength-dispersive X-ray fluorescence spectrometer, ZSX Primus III+ is the latest member of the ZSX Primus series. The ZSX Primus III+ with...