Total Reflection X-ray Fluorescence (TXRF) is a method that can be used for high sensitive elemental analysis on solid sample surface, and has been widely used for detecting contamination on wafer to improve fabrication process yield in the semiconductor industry. On the other hand, there has been increasing need for liquid sample analysis such as contaminated water along with a movement to use TXRF analysis technique in the environmental field.
The TXRF analysis can reduce background intensity, because primary X-rays irradiated with very low glancing angle are totally reflected on the sample surface, and scattered X-rays do not enter the detector. Moreover, the spectra with high S/N ratio can be obtained since only the topmost sample surface is excited to generate fluorescent X-rays. Wide range of elements from Al to U can be analyzed qualitatively and quantitatively by the energy dispersive detector, and it is common to utilize built-in relative sensitivity coefficients for quantitative analysis without using standard samples. Actual example of quantitative analysis of