Process XRR, XRF, and XRD metrology tool for blanket and patterned wafers; up to 300 mm wafers
Advanced state-of-the-art high-resolution XRD system powered by Guidance expert system software
A modernized 2D Kratky system that eliminates data corrections required of traditional systems
This versatile X-ray metrology tool enables high-throughput measurements on blanket wafers ranging from ultra-thin single-layer films to multilayer stacks for process development and film quality control.