Custom designed optics for EUV and X-ray sources
Single wavelength Confocal Max-Flux (CMF) optics for single crystal diffraction
Dual wavelength Confocal Max-Flux (CMF) optics for single crystal X-ray diffraction
Multilayer optics for extreme UV lithography patterning of semiconductor wafers
Custom focusing CMF X-ray optics for X-ray diffraction
Special CMF optic designed for SAXS instrumentation
Parallel beam graded multilayer monochromator for XRD
Focusing graded multilayer monochromator for TXRF
Light element analyzer for laboratory XRF instruments
Custom designed optics for EUV and X-ray sources