XRF and optical metrology tool for blanket and patterned wafers; up to 300 mm wafers
Trace elemental surface contamination metrology by TXRF; up to 300 mm wafers
Ultra-trace elemental surface contamination metrology by TXRF with VPD capability; up to 300 mm wafers
A bespoke, extremely high-flux diffractometer with custom enclosure and the flexibility to utilize both ports of the rotating anode X-ray source.
Advanced state-of-the-art high-resolution XRD system powered by Guidance expert system software
A modernized 2D Kratky system that eliminates data corrections required of traditional systems
This versatile X-ray metrology tool enables high-throughput measurements on blanket wafers ranging from ultra-thin single-layer films to multilayer stacks for process development and film quality control.
Highly versatile multipurpose X-ray diffractometer with built-in intelligent guidance
Spectacular performance combined with dual wavelength versatility, provides the perfect answer for high-capacity Chemical Crystallography labs or for X-ray facilities that support Chemical Crystallography and Protein Crystallography.