200 kV microcomputerized directional industrial X-ray system
High-speed, stationary sample microtomography of large samples
300 kV microcomputerized directional industrial X-ray system
Small, light weight non-destructive testing X-ray generator
250 kV microcomputerized directional industrial X-ray system
The new, next generation benchtop total reflection X-ray fluorescence (TXRF) spectrometer
Trace elemental surface contamination metrology by TXRF; up to 200 mm wafers.
Trace elemental surface contamination metrology by TXRF; up to 300 mm wafers
Ultra-trace elemental surface contamination metrology by TXRF with VPD capability; up to 300 mm wafers