High-resolution benchtop microtomography of large samples
XRF and optical metrology tool for blanket and patterned wafers; up to 300 mm wafers
Trace elemental surface contamination metrology by TXRF; up to 300 mm wafers
Ultra-trace elemental surface contamination metrology by TXRF with VPD capability; up to 300 mm wafers
A modernized 2D Kratky system that eliminates data corrections required of traditional systems
This versatile X-ray metrology tool enables high-throughput measurements on blanket wafers ranging from ultra-thin single-layer films to multilayer stacks for process development and film quality control.
Ultra-high resolution nanotomography using parallel beam geometry
A fast, high-resolution laboratory X-ray topography system for non-destructive dislocation imaging
Our most popular diffractometer for Chemical Crystallography and Mineralogy, configured with either single or dual microfocus sealed tube X-ray sources and an extremely low noise direct X-ray detection detector.